Plasma ion source evaporation system
- Category : Vacuum evaporation system, Vacuum system
- Feature of product:
- The machine is suitable for academic, research and industrial use.
- The substrate size is 2~8 inch wafer.
- Fast coating speed and good adhesion and compactness.
- Simple structure and convenient maintenance.
- Use heating wire method for heating, and different modules for temperature control
- Process and industry:
- LED ITO transparent conductive film manufacturing process.
- OLED transparent conductive film manufacturing process / oxide multilayer film manufacturing process.
- Research machines for academic and research circles
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