ALD (atomic layer) system
- Category : ADL deposition system, Vacuum system
- Feature of product:
- LOAD-LOCK CST IN/OUT operator model.
- Heat and plasma chemical vapor deposition can obtain ultra-thin films with high uniformity.
- 100% shape retention, precise thickness control, and excellent uniformity specifications.
- PE MODEL is suitable for low process temperature
- Process and industry:
- Metal ALD process / Oxide ALD process / Nitride ALD process
- LENS AR optical coating / MINI LED / MICRO LED and other industries.
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