Electron beam evaporation system
- Category : Vacuum evaporation system, Vacuum system
- Feature of product:
- The machine is suitable for academic, research and industrial use.
- The substrate size is 2~8 inch wafer.
- High production capacity in the industry.
- Substrate water cooling mechanism, which can be used in low temperature substrate manufacturing process.
- Customized machine design, which can be designed according to customer requirements.
- High market share.
- High vacuum pumping speed, increasing machine productivity.
- Plasma cleaning process or ion cleaning process can be done according to customer needs.
- Process and industry:
- Metal evaporation process / oxide evaporation process / Au/Sn and other alloy evaporation process.
- LED electrode/ITO oxide/MOSFET electrode.
- Third-generation semiconductor electrode coating/academic and research industry research machine
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