Plasma Clean System
iRP
- Category : Plasma clean system, Vacuum system
- Feature of product:
- It has the characteristics of high efficiency, high quality and low operating cost.
- Using radio frequency (RF) power supply, it is easy to control and easy to operate.
- It has an automatic pressure control system (APC system) to accurately control the process pressure.
- It can have multiple plasma sources (ICP/RIE/PE) at the same time.
- Process and industry:
- LED/semiconductor/industry/passive components/optical components.
- Surface cleaning/Removal of residual photoresist (DESCUM)/Film removal/Wire/(Die) Bonding pretreatment.
- Product Gallery:
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